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Film forming equipment(CVD) - メーカー・企業と製品の一覧

更新日: 集計期間:Aug 13, 2025~Sep 09, 2025
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Film forming equipmentの製品一覧

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Graphene CVD deposition device

Equipped with a rapid cooling mechanism using slide movement of the furnace.

This is a tubular furnace thermal CVD device for synthesizing graphene films. It is equipped with a slide movement mechanism for the furnace, allowing for rapid heating and cooling of samples. An optional motor-driven automatic slide function can also be added. Additionally, by adding a turbo vacuum pump as an option, even higher quality graphene can be deposited.

  • Other physicochemical equipment
  • CVD Equipment

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DLC (Diamond-Like Carbon) Film Deposition Device

For medical applications and optical components! Plasma CVD equipment that can reduce initial and running costs.

The "Diamond-Like Carbon Film Deposition Device" is a thermal cathode PIG (Penning Ion Gauge Discharge Type) plasma CVD device. It enables processing at low temperatures and high vacuum, achieving the formation of DLC (Diamond-Like Carbon) films with excellent hardness and smoothness. Compared to other methods, it allows for independent control of the amount and energy of ions incident on the substrate, enabling extremely wide-ranging control of film quality. Additionally, Tosei Corporation also offers surface treatment processing that widely utilizes the excellent characteristics of diamond-like carbon films on materials such as cemented carbide, stainless steel, and tool steel. 【Features】 ■ Low friction coefficient ■ Wear resistance ■ Low aggressiveness ■ Non-welding ■ Insulating *For more details, please refer to the catalog or feel free to contact us.

  • Other contract services

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Film-forming device "Corial 200 Series"

A plasma etching and deposition device that can be configured according to its purpose.

We would like to introduce our "Corial 200 Series." This research and development equipment utilizes a common platform and can be configured as RIE, ICP, ICP+RIE, ICP-CVD, or PECVD depending on the application. Wafer sizes are 50mm, 100mm, 150mm, and 200mm. 【Features】 ■ Utilizes a common platform ■ RIE, ICP, ICP+RIE, ICP-CVD, or PECVD equipment ■ Designed for research and development ■ Wafer sizes are 50mm, 100mm, 150mm, and 200mm * You can download the English version of the catalog. * For more details, please refer to the PDF document or feel free to contact us.

  • Etching Equipment

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Hot Filament CVD Film Deposition Device MPHF

It is a compact tabletop CVD surface treatment device equipped with a hot filament (hot wire).

The W filament installed near the sample can be heated up to 2000°C, promoting the decomposition of various reaction gases. The active species (radicals) generated by gas decomposition accumulate on the sample surface to form a film.

  • Other processing machines

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Plasma deposition device "KOBUS F.A.S.T.(R)"

Utilizing pulse functionality! It is possible to produce thin films equivalent to ALD in the same processing time as conventional CVD.

"KOBUS F.A.S.T.(R)" is a plasma deposition device for industrial ALD-level film quality. By utilizing a pulse function, it is possible to produce films equivalent to ALD (Atomic Layer Deposition) in the same processing time as conventional CVD. The process temperature ranges from 80°C to 500°C, with wafer sizes of 150mm and 200mm, and a deposition rate of 0.1nm/min to 500nm/min. 【Specifications】 ■ Process temperature: 80°C to 500°C ■ Wafer sizes: 150mm, 200mm ■ Deposition rate: 0.1nm/min to 500nm/min ■ Aspect ratio ・20:1 * You can download the English version of the catalog. * For more details, please refer to the PDF materials or feel free to contact us.

  • Other inspection equipment and devices

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Tabletop CNT/Graphene Film Deposition Device

This is a tabletop CVD device that can easily synthesize long-length powder CNTs, vertically aligned CNTs, and graphene films.

Of course, organic liquid raw materials, as well as hydrocarbon raw gases such as acetylene gas and methane gas, are standardly equipped with introduction ports for H2 reduction gas, making it easy to synthesize various types of CNTs. Additionally, rapid cooling of the substrate heater is possible, allowing for easy film formation of graphene membranes.

  • Other processing machines

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Creative Coatings "Vapor Technology"

We will introduce the technologies and processing examples we propose based on the work material, film type, and film thickness!

"Vapor phase technology" is utilized in various fields such as 'new materials and substances' and 'energy' including resin raw materials and fuel cells, as well as in 'medical and healthcare' applications like medical sensors and devices, and in 'mobile devices', 'wearable devices', and 'automotive' sectors including electronic components and new displays. Additionally, it achieves film formation in the range of 1nm to 1000nm with diverse processes, film thicknesses, and types. Coating is performed using deposition methods such as evaporation, CVD, ALD, and sputtering. 【Features】 ■ ALD Robot CVA series Enables high-quality film formation at low temperatures, which is considered difficult in ALD. ■ Barrel-type ALD Robot CVA-B series A fusion of low-temperature ALD equipment and barrel mechanism. ■ Low-temperature high-frequency excitation DLC film formation device CVC series Allows for good adhesion film formation from graphite to DLC at low temperatures. ■ Bubbling CVD Robot CVB series Liquid to gas Enables low-cost and high-quality film formation at low temperatures. ■ IBAD (Ion Beam Assisted Deposition) CVI series Examples of contract film formation using IBAD Allows for low-energy irradiation at low temperatures, improving the adhesion of transparent conductive films (Zn O) and high-melting-point metal electrode formation for touch panels.

  • Contract manufacturing

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Ion Beam Etching and Deposition Equipment 'QuaZar'

It is possible to reduce total ownership costs! Achieving top-class uniformity and throughput.

"QuaZar" is an etching and deposition device that achieves process results in challenging etching processes and thin film formation applications through a large-area ion source and advanced motion control. The Marathon grids technology of this product is a key element and can be installed in your existing systems. Many customers around the world have successfully improved the performance of their existing equipment with grid technology, extending its lifespan by more than double. 【Features】 ■ Uniformity <2% 3σ (200mm wafer), with scanning motion achieving <0.6% 3σ ■ Ion Source, Marathon Grid, and Dual PBN have doubled the MTBM compared to conventional systems and can be equipped on existing devices from other manufacturers ■ Clustering with our PVD, CVD, etc. is possible ■ 150mm, 200mm *For more details, please feel free to contact us.

  • Etching Equipment

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Solid Source ECR Plasma Deposition Device "AFTEX-8000 Series"

A fully automatic multilayer film forming device that can form multilayer films with excellent uniformity!

The AFTEX-8000 series is a fully automatic multi-layer film formation device that features two ECR plasma sources arranged at an angle in a single film formation chamber, capable of forming high-quality optical thin films and multi-layer films with excellent uniformity on substrates up to 8 inches in diameter. By using a high-activity, high-density ECR (Electron Cyclotron Resonance) plasma source and placing a target in the plasma extraction section, it achieves ECR plasma deposition using a solid source. There is no need to use hazardous gases like those in CVD, eliminating the need for exhaust gas treatment, making it an environmentally friendly film formation technology. 【Features】 ■ High insulation film characteristics ■ Multi-layer films ■ Dense and flat films ■ Low damage ■ Long-term stable operation *For more details, please refer to the catalog or feel free to contact us.

  • Other semiconductor manufacturing equipment

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Tabletop Type Etching and Film Deposition Device 'Plasma POD Series'

For educational institutions and small facilities! A desktop system that allows for easy operation with a touch panel.

The "Plasma POD Series" is a small and compact tabletop etching and deposition device. It is recommended for those who have limited installation space and are considering the introduction of an etching and deposition device at a low cost. Please feel free to contact us if you have any inquiries. 【Features】 ■ Maximum device size: 80cm x 80cm x 80cm (height) ■ Easy operation with a touch panel * You can download the English version of the catalog. * For more details, please feel free to contact us.

  • Etching Equipment

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F.A.S.T Solution

High-quality oxide, nitride, and metal films can be deposited with a high film formation rate!

"KOBUS-F.A.S.T" is a solution that achieves high-quality thin film deposition processing, not only through the F.A.S.T process that balances the coverage of ALD and the deposition rate of PECVD but also enables ALD deposition. It is used for applications involving base layer SiO2, barrier layer TiO2, and metal layers Cu, Co, or transparent conductive ZnOx with ALD and F.A.S.T high-rate deposition while maintaining good coverage. This is recommended for engineers who are exploring methods to improve deposition speed while maintaining film quality and coverage in ALD deposition. 【Features】 ■ A process that balances the coverage of ALD and the deposition rate of PECVD ■ ALD deposition is also possible with this equipment ■ Capable of high-quality deposition of oxides, nitrides, and metals with high deposition rates *For more details, please feel free to contact us.

  • others

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